Constricted Plasma Source with permanent ring magnet producing a streaming oxygen plasma.
Awarded for "A new bioelectronic device interfacing a matrix of living neurons to a CCD for massively scaleable readout of neuronal activity."
Some years ago the group started to look toward possible biological applications of the surface modification tools it had developed. One such research project was an exploration of the utility of variously-modified surfaces for the growth of neurons in culture. A product of this research was that our vacuum-arc-plasma deposited diamond-like carbon (DLC) provided a highly "neuro-friendly" surface. In subsequent work together with collaborators in LBNL's BioscienwapImg(1,0,/*id*/'img11',/*url*/'images/button7A.jpg')" onmouseup="FP_swapImg(0,0,/*id*/'img11',/*url*/'images/button79.jpg')" fp-style="fp-btn: Soft Capsule 6; fp-orig: 0" fp-title="Back to Top">
For growth of III-V semiconductor films (such as GaN), activated nitrogen species are needed that have very low energy (< 20 eV) to avoid "ion damage" to the growing films. Ion sources operate usually at much higher energy, and when tuned down to low energy, their current becomes very small. Among the alternative ion sources, the Constricted Plasma Source is very appealing because simple DC operation is combined with very low energy (most ions have just a few eV), and very low level of contamination. The source is based on a potential double-layer that forms when the electrons of the glow discharge are forced to pass a narrow constriction such as an aperture or slit. The constriction can also be used to set up differential pressure, with relatively high pressure in the source body and low pressure near the anode and processing chamber. Very low process chamber pressures of about 10-5 Torr have been demonstrated for MBE (molecular beam epitaxy) growth conditions.
The source can be operated with virtually all gases, including reactive gases such as nitrogen and oxygen for nitride and oxide films, respectively. The efficiency of the source can be enhanced by utilizing a magnetic field near the constriction. Different versions of the Constricted Plasma Source have been designed and used.
Constricted Plasma Source with permanent ring magnet producing a streaming oxygen plasma.
Awarded for "A new bioelectronic device interfacing a matrix of living neurons to a CCD for massively scaleable readout of neuronal activity."
Some years ago the group started to look toward possible biological applications of the surface modification tools it had developed. One such research project was an exploration of the utility of variously-modified surfaces for the growth of neurons in culture. A product of this research was that our vacuum-arc-plasma deposited diamond-like carbon (DLC) provided a highly "neuro-friendly" surface. In subsequent work together with collaborators in LBNL's BioscienwapImg(1,0,/*id*/'img11',/*url*/'images/button7A.jpg')" onmouseup="FP_swapImg(0,0,/*id*/'img11',/*url*/'images/button79.jpg')" fp-style="fp-btn: Soft Capsule 6; fp-orig: 0" fp-title="Back to Top">
For growth of III-V semiconductor films (such as GaN), activated nitrogen species are needed that have very low energy (< 20 eV) to avoid "ion damage" to the growing films. Ion sources operate usually at much higher energy, and when tuned down to low energy, their current becomes very small. Among the alternative ion sources, the Constricted Plasma Source is very appealing because simple DC operation is combined with very low energy (most ions have just a few eV), and very low level of contamination. The source is based on a potential double-layer that forms when the electrons of the glow discharge are forced to pass a narrow constriction such as an aperture or slit. The constriction can also be used to set up differential pressure, with relatively high pressure in the source body and low pressure near the anode and processing chamber. Very low process chamber pressures of about 10-5 Torr have been demonstrated for MBE (molecular beam epitaxy) growth conditions.
The source can be operated with virtually all gases, including reactive gases such as nitrogen and oxygen for nitride and oxide films, respectively. The efficiency of the source can be enhanced by utilizing a magnetic field near the constriction. Different versions of the Constricted Plasma Source have been designed and used.
Constricted Plasma Source with permanent ring magnet producing a streaming oxygen plasma.
Awarded for "A new bioelectronic device interfacing a matrix of living neurons to a CCD for massively scaleable readout of neuronal activity."
Some
years ago the group started to look toward possible biological applications of
the surface modification tools it had developed. One such research project was
an exploration of the utility of variously-modified surfaces for the growth of
neurons in culture. A product of this research was that our vacuum-arc-plasma
deposited diamond-like carbon (DLC) provided a highly "neuro-friendly" surface.
In subsequent work together with collaborators in LBNL's Biosciences Division
(Eleanor Blakely, Kathy Bjornstad, and Chris Rosen), we demonstrated that DLC
deposited in a pattern could provide a route for growing large patterns of
neurons. The next step was to do this patterned growth on the surface of a CCD
(charge coupled device, a multi- pixel detector as used in all digital cameras).
The large array of electrostatic detector elements was used to provide a readout
of the action potential activity throughout the neural array.
Development of the Neural Matrix CCD is now under way in collaboration with
Cellular Bioengineering Incorporated, Inc. (CBI), a life sciences company
focusing on the bioengineering of tissues for the replacement and repair of
injured and diseased organs; CBI researchers Amy Weintraub, Ryan Littrell, Kevin
T.C. Jim, Kevin Chinn, Leslie Isaki, and Geming Lui have contributed. Current
research focuses on detection of neurotoxins and is funded by the Defense
Advanced Research Projects Agency (DARPA).
The letters "CBI" formed by patterned neuronal growth (CBI = Cellular Bioengineering Inc, the industrial collaborator in this program)
For more information on these R&D 100s, please contact André Anders, or Ian Brown,
